Ice lithography using tungsten hexacarbonyl

Ice lithography (IL) fabricates 2D and 3D patterns using electron-solid interaction principle. Herein, we report IL patterning of the negative tone metalorganic precursor. The precursor is condensed at 80 K. It then patterned a 5–20 keV electron beam. pattern thickness surface roughness increase with area dose. line linewidth also growing doses. XPS results show that tungsten bound to oxygen; metallic WC bonds are absent, which suggests hexacarbonyl contains oxidized embedded in carbon oxygen matrix. Finally, was investigated as an etch mask for nanofabrication applications. silicon plasma etching selectivity 30:1, comparable commercial photoresists.